Developer Concentration Management
Device DCS (Developer Control System)
Technology Ownership

In the photolithography process, we have domestically developed a Developer Control System that precisely controls the concentrations of TMAH, ultrapure water (DI Water), and 2.38% diluted solution within the developer tank. Alkali, Carbonate, Photo Resist concentrations are precisely controlled using a Developer Control System.
We have developed this system domestically and possess the world's first technology incorporating a three-component concentration meter.

DCS (Developer Control System)

We have secured the developer concentration control system technology used in photolithography processes for the first time in Korea, and hold a total of five patents, including the patent (No. 10-1332191) related to the LCD/OLED developer concentration calculation method and concentration control system.

Core features

  • Concentration control range

    2.380%±0.01%
    (target value ±0.005%)

  • PR Concentration
    Control Range

    Spectrophotometer
    Set-point ±0.05ABS

  • World's first 3-component
    concentration meter applied

※ The existing two-component concentration meter measured only TMAH and carbonate concentrations, leading to measurement errors depending on PR concentration. This issue was improved in the three-component concentration meter.